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RIL's Only Vimal receives US patent for odour resistant fabric technology

The patent is for the technology that enables fabric to resist the settlement of micro-organisms offering freedom from perspiration odour.

RIL's Only Vimal receives US patent for odour resistant fabric technology
Mukesh Ambani, CMD, Relianc Industries Ltd with his wife Nita Ambani during the opening ceremony of Jio MAMI 18th Mumbai Film Festival at the Royal Opera House, in Mumbai, on Oct 20, 2016. Photo: IANS
Written By: ZeeBiz WebTeam
Updated: Tue, Nov 29, 2016
07:24 pm
Mumbai, ZeeBiz WebDesk
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Reliance Industries Ltd (RIL) brand Only Vimal announced that it was granted a patent by the US government’s United Sates Patent & Trademark Office for its DEO2 process technology. The patent is for the technology that enables fabric to resist the settlement of micro-organisms offering freedom from perspiration odour.

The Indian government had granted patent to DEO2 technology in July 2015.

RIL has developed DEO2 a fabric processing technology that provides anti-microbial finish on fabric that arrest the growth of fungi and bacteria, keeping the fabric clean and fresh, the company said in a release. It added that the DEO2 technology enables the fabric to withstand extreme temperature and demanding daily tasks. The fabric provides protection to the users even after more than 100 home washes.

RIL’s DEO2 process innovations allows it to process 100% Wool, 100% Rayon, 100% Polyester, Polyester/Viscose, Polyester/Wool and other combination fabrics with anti-microbial coating.

Pradeep Bhandari, CEO (textiles business), RIL said, “the US patent award is a testimony to our thrust on the technological innovation. Our textile manufacturing processes are amongst the best technologically and innovative process available globally. At Reliance we emphasize on making cutting-edge concept design, processes and products research that provides benefits to the end customers. ”

The company is focusing on domestic market as typically warm and humid tropical environs in Indian cause perspiration and provide ideal condition for growth of bacterial and fungi on once cloths.